Celerity Files Suit Against Ultra Clean

MILPITAS, CA, September 19, 2005 – Celerity, Inc. has filed a patent infringement lawsuit against Ultra Clean Holdings, Inc. (NASDAQ: UCTT), and its subsidiary Ultra Clean Technology Systems and Service, Inc., Menlo Park, CA.

The suit, filed in federal court in Delaware, alleges Ultra Clean has infringed seven patents by developing and marketing products that use Celerity’s fluid distribution technology.

“Celerity has invested significant financial and personnel resources to develop our fluid distribution systems, including manifold blocks, gas panels and systems that best serve our customer’s needs.” said Joe Foster, senior vice president of technology and marketing at Celerity. “We will vigorously defend our technology portfolio against unauthorized use.”

Celerity’s patented fluid distribution technology is used in semiconductor manufacturing and other related industries requiring high precision process control.

About Celerity

Celerity is a leader in the design and production of high-performance gas and chemical delivery process modules that are integral to the equipment used in manufacturing semiconductors, flat panel displays, and related products. For additional information, please visit www.celerity.net.

CONTACTS

Industry Media Inquiries

Carol Kimura
Director of Corporate Marketing
Phone: +1 408 935 4500
Email: ckimura@celerity.net

Financial Media and Investor Inquiries

Ron Lacey
Vice President of Finance
Phone: +1 408 935 4500
E-mail: rlacey@celerity.net

Press Releases
LF100
The Celerity LF100 employs proprietary technology to meet the needs of the most demanding wet chemical processes. This technology utilizes non-intrusive ultrasonic sensors to ensure that liquids are delivered without impacting sensitive process materials and eliminating particulate contribution from the component. Closed-loop control provides fast recovery time for setpoint changes and fluctuation in facility pressure.
Benefits:
  • Provides solution for problematic peristaltic pumps
  • Optimizes chemical consumption, improving process reproducibility
  • Repeatable controlled dispense rates minimizes waste
  • Reduces wafer defects attributed to current dispensing methods