Celerity ®

Celerity markets standard flow analog and digital gas flow controllers, control valves, and meters with flow regimes of 30 slm and lower. Available in a selection that supports a variety of needs, our gas flow controllers target applications such as >1µm process node, gas abatement, coating, and general industrial uses.

Celerity’s selection of high-flow gas flow controllers, control valves and meters includes flow regimes of 30slm to 150slm full scale flow ranges. Our products are designed around a high stroke valve that enables an extended differential pressure operating range. The high-flow products target applications for flat panel display, liquid crystal display, annealing, epitaxial wafer fabrication, and purging applications.

Celerity is responding to next generation process nodes with a line-up of high-performance gas flow controllers, control valves and meters. These products feature high accuracy (±0.5% S.P.), and fast response time (<300msec). They support critical applications such as 1µm to 45nm plasma-based process nodes and next generation flat panel display processes.

Celerity specialty gas flow controllers, control valves and meters provide stable control and precision measurement for applications outside non-standard flow regimes. Our specialty products feature low-inlet, differential pressure (4 to 200 torr) and/or high temperature (>55°C) operating capability for low vapor pressure materials. Typical customer applications for our specialty products include ion implant, dopant CVD, and atomic layer deposition.

In addition to our flow controllers, Celerity offers a range of related accessories, including user interface and configuration software, power supplies, and interface assemblies (i.e. cables, adapters, etc.). Our accessories’ applications include bench top test fixtures, on-tool qualification and retrofit applications.

To support the needs of thin-film and etch processes, Celerity develops metrology products used in the manufacturing and servicing of MFCs. Our offerings include the gas flow verifier (GFV) and the digital calibration platform (DCP).

• Gas Flow Verifier (GFV): The Celerity GFV series is designed to validate accuracy on-tool with actual process. It enables accurate, faster flow checks compared to traditional process chamber-based leak-up tests.
• Digital Calibration Platform (DCP): The Celerity DCP is an off-tool digital calibration platform and is the optimum choice for calibration departments and service labs.

To ensure our leadership in gas measurement and flow control Celerity maintains an in-house gas research and development laboratory. The lab is unique in its capability of testing actual process gases for dry semiconductor processing. This capability allows us to demonstrate accurate gas behavior under customer conditions rather than the common practice of extrapolating theoretical conversion models from a surrogate gas such as nitrogen. In addition to existing industry standard instrumentation, we apply our own unique flow verifier techniques developed within Celerity in order to build gas characteristic tables. In this way, customers are assured that our products meet their process requirements with every process gas. To learn more about our gas R&D and applications laboratory facility, click here.